ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME
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United States of America Patent
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Issued Date -
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app pub date -
May 30, 2014
filing date -
Jun 30, 2003
priority date (Note) -
Abandoned
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Abstract
The present invention provides a novel organosilicon compound and polysiloxane which are useful as electronic materials, optical materials, coating materials, sealing materials and catalyst carriers and which can be used as additives for improving various physical properties such as flame retardancy, heat resistance, weatherability, light resistance, electric insulating property, a surface characteristic, hardness, a mechanical strength and a chemical resistance of a polymer material. That is, the present invention relates to an organosilicon compound represented by Formula (1) and polysiloxane comprising the above organosilicon compound as a monomer:
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
JP | B2 | JP4581472 | Apr 28, 2004 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PUBLISHED GRANTED PATENT (SECOND LEVEL) | ORGANIC SILICON COMPOUND AND METHOD FOR PRODUCING SAME AND POLYSILOXANE AND METHOD FOR PRODUCING SAME POLYSILOXANE | Nov 17, 2010 | |||
JP | A1 | JPWO2005000857 | Jun 30, 2004 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
DOMESTIC RE-PUBLICATION OF PCT APPLICATION | 有機ケイ素化合物とその製造方法、およびポリシロキサンとその製造方法 | Sep 07, 2006 | |||
WO | A1 | WO2005000857 | Jun 30, 2004 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | 有機ケイ素化合物とその製造方法、およびポリシロキサンとその製造方法 | Jan 06, 2005 | |||
US | B2 | US7524917 | Dec 30, 2005 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT AS SECOND PUBLICATION | Organosilicon compound and production process for the same, and polysiloxane and production process for the same | Apr 28, 2009 | |||
US | A1 | US20090182112 | Mar 13, 2009 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
FIRST PUBLISHED PATENT APPLICATION | Organosilicon compound and production process for the same, and polysiloxane and production process for the same | Jul 16, 2009 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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CHISSO PETROCHEMICAL CORPORATION | 7-3 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO |
International Classification(s)

- 2014 Application Filing Year
- C08G Class
- 2377 Applications Filed
- 2099 Patents Issued To-Date
- 88.31 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
OOTAKE, Nobumasa | Chiba, JP | 27 | 200 |
# of filed Patents : 27 Total Citations : 200 | |||
YOSHIDA, Kazuhiro | Chiba, JP | 333 | 2369 |
# of filed Patents : 333 Total Citations : 2369 |
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Patent Citation Ranking
- 0 Citation Count
- C08G Class
- 0 % this patent is cited more than
- 11 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 18, 2026 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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