SUBSTRATE CLEANING AND DRYING METHOD AND SUBSTRATE DEVELOPING METHOD

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United States of America Patent

APP PUB NO 20140261571A1
SERIAL NO

14156848

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Provided is a substrate cleaning and drying method, including a cleaning step of cleaning a developed substrate by supplying a cleaning liquid to the substrate; a puddle-forming step of forming a puddle of the cleaning liquid on the substrate; a film-thinning step of thinning a film thickness of the cleaning liquid on the substrate; and a drying step of drying the substrate by spinning the substrate and generating outward airflow and inward airflow between the outward airflow and the substrate, the outward airflow covering a portion above the substrate and the inward airflow causing removal of the cleaning liquid on the substrate.

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Patent Owner(s)

Patent OwnerAddress
SCREEN SEMICONDUCTOR SOLUTIONS CO LTDKYOTO

International Classification(s)

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  • 2014 Application Filing Year
  • B08B Class
  • 792 Applications Filed
  • 630 Patents Issued To-Date
  • 79.55 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20142015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
GOTO, Tomohiro Kyoto-shi, JP 33 152
KASHIYAMA, Masahito Kyoto-shi, JP 21 95
MORITA, Akihiko Kyoto-shi, JP 20 2423
TAKAHASHI, Yasuo Kyoto-shi, JP 110 1009

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Patent Citation Ranking

  • 2 Citation Count
  • B08B Class
  • 14.63 % this patent is cited more than
  • 11 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges863947516115101 - 1011 - 2021 - 3031 - 4041 - 5091 - 1000255075100125150175200225250275300325350375400425

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