SUBSTRATE CLEANING AND DRYING METHOD AND SUBSTRATE DEVELOPING METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 18, 2014
app pub date -
Jan 16, 2014
filing date -
Mar 15, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a substrate cleaning and drying method, including a cleaning step of cleaning a developed substrate by supplying a cleaning liquid to the substrate; a puddle-forming step of forming a puddle of the cleaning liquid on the substrate; a film-thinning step of thinning a film thickness of the cleaning liquid on the substrate; and a drying step of drying the substrate by spinning the substrate and generating outward airflow and inward airflow between the outward airflow and the substrate, the outward airflow covering a portion above the substrate and the inward airflow causing removal of the cleaning liquid on the substrate.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SCREEN SEMICONDUCTOR SOLUTIONS CO LTD | KYOTO |
International Classification(s)

- 2014 Application Filing Year
- B08B Class
- 792 Applications Filed
- 630 Patents Issued To-Date
- 79.55 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
GOTO, Tomohiro | Kyoto-shi, JP | 33 | 152 |
# of filed Patents : 33 Total Citations : 152 | |||
KASHIYAMA, Masahito | Kyoto-shi, JP | 21 | 95 |
# of filed Patents : 21 Total Citations : 95 | |||
MORITA, Akihiko | Kyoto-shi, JP | 20 | 2423 |
# of filed Patents : 20 Total Citations : 2423 | |||
TAKAHASHI, Yasuo | Kyoto-shi, JP | 110 | 1009 |
# of filed Patents : 110 Total Citations : 1009 |
Cited Art Landscape
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Patent Citation Ranking
- 2 Citation Count
- B08B Class
- 14.63 % this patent is cited more than
- 11 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 18, 2026 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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