MASK FOR DUAL TONE DEVELOPMENT
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 11, 2014
app pub date -
May 17, 2013
filing date -
Mar 7, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A mask for dual tone development including a opening pattern region and a partial transparent pattern is provided. The opening pattern region includes a plurality of transparent patterns and a plurality of opaque patterns, and a plurality of opening patterns is defined in a photoresist for dual tone development by the transparent patterns and the opaque patterns. The partial transparent pattern surrounds the opening pattern region.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully