CVD APPARATUS, METHOD OF MANUFACTURING SUSCEPTOR USING THE CVD APPARATUS, AND SUSCEPTOR
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United States of America Patent
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N/A
Issued Date -
Sep 4, 2014
app pub date -
Oct 12, 2012
filing date -
Oct 14, 2011
priority date (Note) -
Abandoned
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Abstract
A masking portion (recessed portion) 20 is provided at the center of a rear surface of a carbonaceous substrate 10. The masking portion 20 includes a first bore portion 20a and a second bore portion 20b. The first bore portion 20a has an inner wall in which a female screw portion 21 is formed. A male screw portion 7a of a masking jig 7 is screw-fitted to the female screw portion 21. The masking jig 7 is fixed to a film forming jig 2. The carbonaceous substrate is thus supported in a standing posture, and the carbonaceous substrate is provided, on a surface, with a firm such as a SiC film or a TaC film except for the recessed portion by introducing gas into the apparatus in this supported state.
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