Method to provide a patterned orientation template for a self-assemblable polymer

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United States of America Patent

PATENT NO 10240250
APP PUB NO 20140245948A1
SERIAL NO

14345891

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Abstract

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A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boots, Henri Marie Joseph Best, NL 10 497
Brizard, Aurelie Marie Andree Eindhoven, NL 5 410
De, Ruiter Jessica Margaretha Eindhoven, NL 1 1
Druzhinina, Tamara Eindhoven, NL 13 407
Finders, Jozef Maria Veldhoven, NL 60 1059
Ketelaars, Wilhelmus Sebastianus Marcus Maria Eindhoven, NL 10 474
Koole, Roelof Eindhoven, NL 42 730
Meessen, Hieronymus Johannus Christiaan Eindhoven, NL 5 426
Nguyen, Thanh Trung Eindhoven, NL 8 412
Peeters, Emiel Eindhoven, NL 61 1191
Van, der Heijden Eddy Cornelis Antonius Netersel, NL 6 417
Van, Heesch Christianus Martinus Eindhoven, NL 23 644
Wuister, Sander Frederik Eindhoven, NL 98 1240

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