Process For Cleaning Shield Surfaces In Deposition Systems
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United States of America Patent
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May 8, 2014
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Feb 2, 2012
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Abstract
A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.
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