METAL-OXIDE SEMICONDUCTOR THIN FILM TRANSISTORS AND METHODS OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20140239291A1
SERIAL NO

14062137

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Abstract

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According to example embodiments a TFT includes: a substrate; a gate electrode on the substrate; a gate insulating layer on the gate electrode; a channel layer on the gate insulating layer, the channel layer including an indium-rich metal-oxide layer; a first electrode on one end of the channel layer; a second electrode on the other end of the channel layer; and a passivation layer on the channel layer between the first and second electrodes.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677
INHA INDUSTRY PATNERSHIP INSTITUTE253 YONGHYUN-DONG NAM-GU INCHEON

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
JEONG, Jae-Kyeong Incheon, KR 52 8067
RYU, Myung-kwan Yongin-si, KR 52 5500
SON, Kyoung-seok Seoul, KR 28 1212

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