MULTI-PLENUM SHOWERHEAD WITH TEMPERATURE CONTROL
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United States of America Patent
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Issued Date -
Aug 21, 2014
app pub date -
Jul 3, 2013
filing date -
Feb 15, 2013
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Abstract
An apparatus for use with radical sources for supplying radicals during semiconductor processing operations is provided. The apparatus may include a stack of plates or components that form a faceplate assembly. The faceplate assembly may include a radical diffuser plate, a precursor delivery plate, and a thermal isolator interposed between the radical diffuser plate and the precursor delivery plate. The faceplate assembly may have a pattern of radical through-holes with centerlines substantially perpendicular to the radical diffuser plate. The thermal isolator may be configured to regulate heat flow between the radical diffuser plate and the precursor delivery plate.
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