PHENOL-BASED SELF-CROSSLINKING POLYMER AND RESIST UNDERLAYER FILM COMPOSITION INCLUDING SAME

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United States of America Patent

APP PUB NO 20140227887A1
SERIAL NO

14343115

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A phenolic self-crosslinking polymer whose self-crosslinking reaction at a heating step is performed without additives for hardening the polymer, and a composition of resist-underlayer-film containing the same, are disclosed. The phenolic self-crosslinking polymer being selected from a group consisting of a polymer represented by Formula 1, a polymer represented by Formula 2 and a polymer represented by Formula 3:

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Patent Owner(s)

Patent OwnerAddress
DONGJIN SEMICHEM CO LTDINCHON KOREA INCHEON

International Classification(s)

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  • 2012 Application Filing Year
  • H01L Class
  • 20465 Applications Filed
  • 18077 Patents Issued To-Date
  • 88.34 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20122013201420152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Jae-Hyun Seoul, KR 351 2242
Kim, Jeong-Sik Hwaseong-si, KR 15 62
Lee, Jae-Woo Bucheon-si, KR 47 304

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Patent Citation Ranking

  • 8 Citation Count
  • H01L Class
  • 7.09 % this patent is cited more than
  • 11 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges7625916189582342423416712683684320001 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0500100015002000250030003500400045005000550060006500

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