HOMOGENOUS PLASMA CHEMICAL REACTION DEVICE
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United States of America Patent
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Issued Date -
Aug 14, 2014
app pub date -
Jan 27, 2014
filing date -
Feb 11, 2013
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Abstract
A plasma system is disclosed. The system includes: a plasma device including at least one electrode; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; a precursor source configured to supply at least one precursor feedstock to the plasma device, wherein the at least one precursor feedstock includes at least one catalyst material; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media and the at least one precursor feedstock at the plasma device to form a plasma effluent.
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