GAS RELEASE DEVICE FOR COATING PROCESS
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United States of America Patent
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Issued Date -
Aug 7, 2014
app pub date -
Jan 28, 2014
filing date -
Feb 5, 2013
priority date (Note) -
Abandoned
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Abstract
A gas release device for a coating process includes an upper plate, a first intermediate plate, a second intermediate plate, and a lower plate, four of which are superposed on each other from top to bottom. The upper plate is linked and communicates with the first intermediate plate through a first passage. The first intermediate plate is linked and communicates with the second intermediate plate through at least two second passages. The second intermediate plate is linked with the lower plate through at least four third passages. The lower plate includes at least four ventholes. In light of this, after a gas of a vapor deposition source enters the inlet, the gas of the same amount can be released out of each venthole to make the thickness of a thin film uniform for relatively higher quality of the coating process.
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