RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN
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United States of America Patent
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N/A
Issued Date -
Aug 7, 2014
app pub date -
Feb 3, 2014
filing date -
Feb 5, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R1 and R2 each independently represents a group represented by general formula (a0-2) or a functional group; V1 and V2 each represents a single bond or an alkylene group of C1 to C10 which may have a substituent; Y1 represents a single bond or a divalent linking group; Y2 represents a fluorinated alkylene group of C1 to C4 which may have a substituent; L1 represents O or a group represented by —NR′1—(R′1 represents H or an alkyl group of C1 to C5); Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
First Claim
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Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | A | JP2014153440 | Feb 05, 2013 |
| KR | A | KR20140100413 | Jan 28, 2014 |
| TW | A | TW201435491 | Jan 28, 2014 |
International Classification(s)
- 2014 Application Filing Year
- G03F Class
- 1816 Applications Filed
- 1533 Patents Issued To-Date
- 84.42 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 11 Age