RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Aug 7, 2014
app pub date -
Feb 3, 2014
filing date -
Feb 5, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R1 and R2 each independently represents a group represented by general formula (a0-2) or a functional group; V1 and V2 each represents a single bond or an alkylene group of C1 to C10 which may have a substituent; Y1 represents a single bond or a divalent linking group; Y2 represents a fluorinated alkylene group of C1 to C4 which may have a substituent; L1 represents O or a group represented by —NR′1—(R′1 represents H or an alkyl group of C1 to C5); Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully