Additives to litho inks to eliminate ink feedback

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United States of America Patent

PATENT NO 10875338
APP PUB NO 20140216286A1
SERIAL NO

14345747

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Abstract

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Provided are web-offset lithographic ink compositions that contain an alkyl thioether surfactant, an alkoxylated modified rosin, or a combination thereof. The ink compositions can be oil-based inks or water-based inks that can be radiation-curable. The resulting ink compositions can be used in web-offset lithographic printing to substantially reduce or eliminate the ink feedback and ink build-up that occurs during printing. Also provided are methods for reducing or eliminating ink feedback and build-up during lithographic printing processes.

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Patent Owner(s)

Patent OwnerAddress
SUN CHEMICAL CORPORATION35 WATERVIEW BOULEVARD PARSIPPANY NJ 07054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Helliblau, Matthias Seligenstadt, DE 1 0
Jones, Jeff Chicago, US 48 1216
Krishnan, Ramasamy North Brunswick, US 39 437

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