METHOD OF MANUFACTURING A MAGNETORESISTIVE DEVICE
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United States of America Patent
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Issued Date -
Jul 31, 2014
app pub date -
Jan 31, 2014
filing date -
Jan 31, 2013
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Abandoned
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Abstract
A method of manufacturing a magnetoresistive-based device includes etching a hard mask layer, the etching having a selectivity greater than 2:1 and preferably less than 5:1 of the hard mask layer to a photo resist thereover. Optionally, the photo resist is trimmed prior to the etch, and oxygen may be applied during or just subsequent to the trim of the photo resist to increase side shrinkage. An additional step includes an oxygen treatment during the etch to remove polymer from the structure and etch chamber.
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