Multiresolution Mask Writing

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United States of America Patent

APP PUB NO 20140212793A1
SERIAL NO

13967339

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Abstract

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Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to write a second shot pattern having a second resolution finer than the first resolution, such that the second shot pattern substantially overlaps with the first shot pattern on the mask substrate.

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Patent Owner(s)

Patent OwnerAddress
MENTOR GRAPHICS CORPORATIONWILSONVILLE OR 97070-7777

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sahouria, Emile Y Sunnyvale, US 17 156

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