Fabrication of High-Throughput Nano-Imprint Lithography Templates

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United States of America Patent

APP PUB NO 20140212534A1
SERIAL NO

13754015

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Abstract

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An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporousfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.

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CITIBANK N A388 GREENWICH STREET NEW YORK NY 10013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fletcher, Edward B Austin, US 13 393
Liu, Weijun Cedar Park, US 78 565
Menezes, Marlon Austin, US 6 110
Selinidis, Kosta S Austin, US 24 198
Wan, Fen Austin, US 49 286
Xu, Frank Y Round Rock, US 174 2481

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