GAS ANALYSIS DEVICE AND CONTAMINATION DETECTION METHOD USED IN SAME

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United States of America Patent

APP PUB NO 20140202233A1
SERIAL NO

14343678

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Abstract

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In order to make it possible to sensitively detect adsorptive gas even in the presence of a small amount of contamination that significantly influences adsorptive gas measurement, a gas injecting mechanism that injects adsorptive injection gas into a flow path through which sample gas is flowed, a gas measuring mechanism that can measure a value related to quantity of the adsorptive gas flowing through the flow path, and a contamination determining part that determines contamination in the flow path on the basis of a value related to a measurement response speed of the gas measuring mechanism to the adsorptive gas are provided.

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Patent Owner(s)

Patent OwnerAddress
HORIBA LTD2 MIYANOHIGASHICHO KISSHOIN MINAMI-KU KYOTO-SHI KYOTO 6018510 ?6018510

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Itaya, Takahiro Kyoto-shi, JP 4 4
Nakatani, Shigeru Kyoto-shi, JP 12 49

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