Method of Measuring a Characteristic
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United States of America Patent
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Issued Date -
Jul 17, 2014
app pub date -
Mar 14, 2014
filing date -
Mar 4, 2009
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
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