Block copolymer, method of forming the same, and method of forming pattern

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United States of America Patent

PATENT NO 9255170
APP PUB NO 20140197132A1
SERIAL NO

14086182

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Abstract

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A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2:

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTD1 SAMSUNG-RO GIHEUNG-GU YONGIN-SI GYEONGGI-DO 17113
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION145 ANAM-RO SEONGBUK-GU SEOUL 02841 02841
SOGANG UNIVERSITY RESEARCH FOUNDATIONSEOUL 04107

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bang, Joona Seoul, KR 13 31
Huh, June Seoul, KR 5 8
Jung, Hyun Jung Seoul, KR 12 28
Kang, Min Hyuck Seoul, KR 22 62
Kang, Na Na Seoul, KR 10 11
Kim, Myung Im Suwon-si, KR 8 30
Kim, Tae Woo Seoul, KR 270 1153
Lee, Jin Yeong Anyang-si, KR 19 97
Lee, Su Mi Hwaseong-si, KR 23 285
Lei, Xie Suwon-si, KR 6 91
Moon, Bong-Jin Seoul, KR 9 85
Park, Seung-Won Seoul, KR 43 197
Woo, Sang Hoon Seoul, KR 9 363

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