System and Method for Cleaning Semiconductor Fabrication Equipment Parts
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Mar 13, 2014
filing date -
Aug 11, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An exemplary embodiment discloses a process for cleaning semiconductor fabrication equipment parts with non-metallic surfaces. The process optionally includes providing a semiconductor fabrication part with a non-metallic surface to be cleaned and applying a dilute aqueous solution to remove contamination from the non-metallic surface. The aqueous solution optionally includes dilute amounts of hydrofluoric acid, nitric acid and hydrogen peroxide. The dilute amounts would optionally be in the ranges of 0.5-1.5% wt. hydrofluoric acid, 0.1-0.5% wt. nitric acid and 1-10% wt. hydrogen peroxide.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
QUANTUM GLOBAL TECHNOLOGIES LLC | QUAKERTOWN PA 18951 |
International Classification(s)

- 2014 Application Filing Year
- B44C Class
- 260 Applications Filed
- 239 Patents Issued To-Date
- 91.93 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Tan, Samantha | Union City, US | 49 | 3743 |
# of filed Patents : 49 Total Citations : 3743 |
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Patent Citation Ranking
- 3 Citation Count
- B44C Class
- 12.29 % this patent is cited more than
- 11 Age
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Fee | Large entity fee | small entity fee | micro entity fee | due date |
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11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 10, 2026 |
Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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