MEMS APPARATUS
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United States of America Patent
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Issued Date -
Jul 10, 2014
app pub date -
Jan 9, 2014
filing date -
Jan 9, 2013
priority date (Note) -
Abandoned
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Abstract
Disclosed herein is a MEMS apparatus comprising a substrate with an etched area, a proof mass disposed at the center of the etched area, and beams supporting the proof mass. The beams are disposed between peripheries of the substrate and the proof mass. The substrate comprises first and second electrodes that are parallel to an axis and extend respectively from opposite regions on the substrate. The proof mass comprises third and fourth electrodes that are parallel to the axis and extend respectively from opposite edges of the proof mass. The first and third electrodes are opposite to and interlaid with each other. The second and fourth electrodes are opposite to and interlaid with each other. With the proof mass constructed as an oxide layer optionally enclosing a connecting layer or as a silicon substrate optionally with a covering layer, the MEMS apparatus is not susceptible to the variation of temperature.
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