REMOVAL OF MASKING MATERIAL
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United States of America Patent
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Issued Date -
Jul 3, 2014
app pub date -
Jan 3, 2013
filing date -
Jan 3, 2013
priority date (Note) -
Abandoned
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Abstract
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate.
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