Device and method for processing strip-type substrates
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United States of America Patent
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Issued Date -
Jul 3, 2014
app pub date -
Nov 26, 2013
filing date -
Nov 27, 2012
priority date (Note) -
Abandoned
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Abstract
The invention relates first to a device for processing a strip-type substrate (1), in particular by coating, in a processing chamber (2), using a processing roller (3) mounted to rotate about an axis of rotation (18) in the processing chamber (2), such that the substrate (1), which is unwound from a first coil (6) with which it is in contact in a helical pattern is processed continuously, wherein the processed, in particular coated, substrate (1) is wound onto a second coil (7), wherein a gas inlet/outlet device (8, 9, 10) is provided for generating a gas stream (11, 12) directed essentially in parallel to the axis of rotation (18). In addition, the invention relates to a method for coating a strip-type substrate (1) in a device.
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