METHOD FOR MAKING A STRUCTURE FOR RESUMING CONTACT
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United States of America Patent
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Issued Date -
Jul 3, 2014
app pub date -
Dec 17, 2013
filing date -
Dec 27, 2012
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Abstract
A method for making a conducting structure comprising steps of:
- forming on a given face of the support comprising at least one conducting element, at least one area for absorbing stresses based on a dielectric material,forming at least one aperture in said dielectric material by applying a mold on said dielectric material, said aperture being provided with inclined walls relatively to a normal to the main plane of said support, the bottom of said aperture revealing said conducting element,filling said aperture with a conducting material.
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