SILICON/GERMANIUM-BASED NANOPARTICLE PASTES WITH ULTRA LOW METAL CONTAMINATION
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United States of America Patent
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Issued Date -
Jun 26, 2014
app pub date -
Nov 22, 2013
filing date -
Dec 20, 2012
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Abandoned
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Abstract
Silicon based nanoparticle inks are described with very low metal contamination levels. In particular, metal contamination levels can be established in the parts-per-billion range. The inks of particular interest generally comprise a polymer to influence the ink rheology. Techniques are described that are suitable for purifying polymers soluble in polar solvents, such as alcohols, with respect metal contamination. Very low levels of metal contamination for cellulose polymers are described.
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