BLOCK COPOLYMER AND PHOTOELECTRIC CONVERSION ELEMENT
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United States of America Patent
Stats
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N/A
Issued Date -
Jun 19, 2014
app pub date -
Mar 30, 2012
filing date -
Mar 31, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Importance

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Abstract
Provide are: a conjugated block copolymer capable of increasing the amount of optical absorption by a photoelectric conversion active layer and controlling the morphology thereof and capable of achieving excellent photoelectric conversion efficiency; and a photoelectric conversion element comprising a composition including an electron accepting material and this kind of conjugated block polymer. A π-electron conjugated block copolymer comprising: a polymer block (A) which involving a monomer unit having at least one heteroaryl skeleton selected from the group consisting of a fused π-conjugated skeleton, a fluorene, a carbazole, a dibenzosilole and a dibenzogermole containing at least one thiophene ring in a part of a chemical structure thereof; and a polymer block (B) involving a monomer unit of a thiophene-2,5-diyl group having a substituent at least at a 3-position thereof.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
KURARAY CO LTD | 1621 SAKAZU KURASHIKI-SHI OKAYAMA 7100801 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Fujita, Akio | Kurashiki-shi, JP | 34 | 332 |
# of filed Patents : 34 Total Citations : 332 | |||
Inagaki, Takuya | Kurashiki-shi, JP | 8 | 30 |
# of filed Patents : 8 Total Citations : 30 | |||
Izawa, Takafumi | Kurashiki-shi, JP | 10 | 27 |
# of filed Patents : 10 Total Citations : 27 | |||
Morihara, Yasushi | Kurashiki-shi, JP | 10 | 51 |
# of filed Patents : 10 Total Citations : 51 | |||
Nakahara, Atsuhiro | Kurashiki-shi, JP | 34 | 81 |
# of filed Patents : 34 Total Citations : 81 | |||
Ogi, Hiroyuki | Kurashiki-shi, JP | 23 | 143 |
# of filed Patents : 23 Total Citations : 143 | |||
Shibuya, Hiromasa | Kurashiki-shi, JP | 24 | 135 |
# of filed Patents : 24 Total Citations : 135 | |||
Sugioka, Takashi | Kaurashiki-shi, JP | 17 | 29 |
# of filed Patents : 17 Total Citations : 29 |
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Patent Citation Ranking
- 8 Citation Count
- H01L Class
- 7.09 % this patent is cited more than
- 11 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 19, 2025 |
Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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