PLASMA SHIELD SURFACE PROTECTION
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United States of America Patent
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Issued Date -
Jun 12, 2014
app pub date -
Dec 11, 2012
filing date -
Dec 11, 2012
priority date (Note) -
Abandoned
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Abstract
Apparatuses and methods are provided for electrostatically inhibiting particle contamination of a surface of a process structure, such as a mask or reticle. The apparatuses include a plasma-generating system configured to establish a plasma shield over the surface of the process structure. The plasma shield includes a plasma region and a plasma sheath over the surface of the process structure, with the plasma sheath being disposed, at least partially, adjacent to the surface of the process structure, between the plasma region and the surface of the process structure. The plasma shield facilitates negatively charging particles within the plasma shield, and electrostatically inhibits negatively-charged particle contamination of the surface of the process structure to be protected.
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