PULSED LASER MICRO-DEPOSITION PATTERN FORMATION

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United States of America Patent

SERIAL NO

14178414

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Abstract

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A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.

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Patent Owner(s)

Patent OwnerAddress
IMRA AMERICA INCANN ARBOR MI 48105

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Che, Yong Ann Arbor, US 51 588
Hu, Zhendong Ann Arbor, US 32 426
LIU, BING Ann Arbor, US 414 3981
Murakami, Makoto Ann Arbor, US 92 1029
Xu, Jingzhou Ann Arbor, US 28 626

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