GALLIUM NITRIDE SUBSTRATE AND METHOD FOR FABRICATING THE SAME

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United States of America Patent

APP PUB NO 20140151714A1
SERIAL NO

14096189

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Abstract

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Exemplary embodiments of the present invention relate to a single-crystal substrate including a buffer layer including a nitride semiconductor, holes penetrating the buffer layer, and a single-crystal nitride semiconductor disposed on the buffer layer.

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Patent Owner(s)

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SEOUL VIOSYS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Hwa Mok Ansan-si, KR 56 730
PARK, Ki Yon Ansan-si, KR 42 107
Son, Young Hwan Ansan-si, KR 41 333
Suh, Daewoong Ansan-si, KR 138 1311

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