WAFER CLEANING APPARATUS AND METHODS
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United States of America Patent
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Issued Date -
Jun 5, 2014
app pub date -
Nov 27, 2013
filing date -
Nov 30, 2012
priority date (Note) -
Abandoned
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Abstract
A wafer cleaning apparatus includes a beam for holding a plurality of semiconductor or solar wafers. The beam includes at least one channel extending axially through the beam. An opening extends from the channel to a location between adjacent wafers. A manifold includes a conduit coupled to the channel and an immersion tank includes an ultrasonic transducer.
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