SILICON/GERMANIUM PARTICLE INKS, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS

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United States of America Patent

APP PUB NO 20140138135A1
SERIAL NO

14144789

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Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.

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Patent Owner(s)

Patent OwnerAddress
NANOGRAM CORPORATIONMILPITAS CA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiruvolu, Shivkumar San Jose, US 56 1135
Dioumaev, Vladimir K Mountain View, US 25 202
Du, Hui Milpitas, US 213 3515
Hieslmair, Henry San Francisco, US 25 437

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