Device for Cleaning Photomask
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United States of America Patent
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Issued Date -
May 22, 2014
app pub date -
Feb 19, 2013
filing date -
Nov 21, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention proposes a device for cleaning photomask comprising a wiping member wrapped on the surface of a central axle and unceasingly washed by cleaning fluid. When the photomask contacts the central axle, the washed wiping member can clean the photomask by rotation of the central axle in light of direction of the photomask's moving. After being wiped clean, the photomask will not be stained with dust or dirt.
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