SOLAR CELL FORMATION APPARATUS AND METHOD

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United States of America Patent

APP PUB NO 20140131198A1
SERIAL NO

13672851

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Abstract

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Apparatuses for forming material films on a solar cell substrate of substantially uniform thickness and processes for forming the same are disclosed. The process performed in the apparatuses is physical vapor deposition (PVD) in some embodiments. In one embodiment, an apparatus includes a specially configured flow aperture. In another embodiment, an apparatus includes moveable shutters which open and close in synchronization with a rotating drum on which substrates are mounted for processing. In other embodiments, the apparatus includes a variable power supply or drum speed control which automatically vary the power supply to the apparatus or drum speed respectively in synchronization with the rotating drum.

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Patent Owner(s)

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TSMC SOLAR LTDNO 5 KEYA W ROAD DAYA DISTRICT TAICHUNG CITY 428-82

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHAO, Ying-Chen Hsinchu City, TW 26 766
TENG, Edward Sunnyvale, US 10 63
YANG, Chih-Jen Taichung City, TW 37 137

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