METHOD FOR FABRICATING A PATTERNED RETARDER
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United States of America Patent
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Issued Date -
May 15, 2014
app pub date -
Nov 11, 2013
filing date -
Nov 13, 2012
priority date (Note) -
Abandoned
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Abstract
A method for fabricating a patterned retarder includes bonding first trans-missive substrate that has a patterned photomask layer to a front surface of second light-transmissive substrate, and forming a photo-orientable layer on a rear surface of the second light-transmissive substrate such that a distance between the photomask layer and the photo-orientable layer is relatively small. Linear polarized light is allowed to pass through light-transmissive regions in the photomask unit to irradiate first regions of the photo-orientable layer. Due to the small distance, the polarized light can be either collimated light or uncollimated light.
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