TITANIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION

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United States of America Patent

SERIAL NO

14151161

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Abstract

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Disclosed are titanium-containing precursors and methods of synthesizing the same. The compounds may be used to deposit titanium, titanium oxide, strontium-titanium oxide, and barium strontium titanate containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.

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Patent Owner(s)

Patent OwnerAddress
AMERICAN AIR LIQUIDE INCHOUSTON TX

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DUSSARRAT, Christian Tokyo, JP 139 7373
PALLEM, Venkateswara R Hockessin, US 52 2166

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