DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM
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United States of America Patent
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Issued Date -
May 8, 2014
app pub date -
Jan 14, 2014
filing date -
Jul 23, 2007
priority date (Note) -
Abandoned
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Abstract
Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
HUETTINGER ELEKTRONIK GMBH + CO KG | BOETZINGER STRASSE 80 FREIBURG D-79111 |
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Hintz, Gerd | Pfaffenweiler, DE | 8 | 317 |
Kirchmeier, Thomas | Teningen, DE | 20 | 601 |
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