DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM

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United States of America Patent

APP PUB NO 20140125315A1
SERIAL NO

14154400

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Abstract

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Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.

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Patent Owner(s)

Patent OwnerAddress
HUETTINGER ELEKTRONIK GMBH + CO KGBOETZINGER STRASSE 80 FREIBURG D-79111

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hintz, Gerd Pfaffenweiler, DE 8 317
Kirchmeier, Thomas Teningen, DE 20 601

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