Measurement Structure for Radio Frequency Scattering Parameter Measurement Applying Two Calibrators and Calibration Method Thereof

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United States of America Patent

APP PUB NO 20140118004A1
SERIAL NO

13664002

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Abstract

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The present invention provides a measurement structure for radio frequency (RF) scattering parameter measurement applying two calibrators and a calibration method thereof, comprising an offset series device calibrator, an offset shunt device calibrator and a tested object measuring instrument. Herein the lengths of the transmission lines for the offset series device calibrator and the offset shunt device calibrator and the one of the transmission line for the tested object measuring instrument are equivalent such that the offset series device calibrator, the offset shunt device calibrator and the tested object measuring instrument have the identical error box. After having acquired the scattering parameter matrix for the error box through the calibration method, it is possible to connect a tested electronic device onto the tested object measuring instrument and perform operations on the uncorrected measurement data thereby obtaining the RF scattering parameters of the tested object.

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Patent Owner(s)

Patent OwnerAddress
YUAN ZE UNIVERSITYTAOYUAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HUANG, Chien-Chang Taoyuan County, TW 84 516

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