Strain and Kinetics Control During Separation Phase of Imprint Process
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Jan 8, 2014
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Oct 24, 2008
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Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
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