COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCTOR APPARATUS
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United States of America Patent
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Issued Date -
May 1, 2014
app pub date -
Oct 28, 2013
filing date -
Oct 29, 2012
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Abstract
An advanced coating for showerhead used in plasma processing chamber is provided. The advanced coating is formed using plasma enhanced physical vapor deposition. The coating formation involved a physical process, such as condensation of source material on the showerhead surface, and chemical process, wherein active species from plasma interact with the condensed source materials. Also, non-reactive species from the plasma impinge on the bottom surface to condense the formed coating.
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