Double-multilayer Monochromator
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United States of America Patent
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N/A
Issued Date -
Apr 24, 2014
app pub date -
Oct 18, 2013
filing date -
Oct 19, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention relates to a double-multilayer monochromator. The monochromator comprises a base, a housing moveably mounted on the base and having in one side thereof at least one inlet window for the inlet of a X-ray beam and in another side thereof an outlet window for the outlet a monochromatized X-ray beam, support means mounted in the housing to support opposed mirror pairs, wherein each of the mirrors has a coated surface, each of said coated mirror surfaces being coated with a multilayer coating in alternating layers of a scatterer material (A) having a thickness dA and a spacer material (B) having a thickness dB. The present monochromator provides an enhanced purity of the synchrotron beam, where even and odd orders of higher harmonics are rejected. This is achieved in that the ratio dA:(dA+dB) on one of the facing mirrors of the mirror pairs is about 1:2 and the ratio dA:(dA+dB) on the other of the facing mirrors of the mirror pairs is about 1:3.
First Claim
Other Claims data not available
Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| EP | A1 | EP2722852 | Oct 19, 2012 |
| JP | A | JP2014112532 | Oct 21, 2013 |
International Classification(s)
- 2013 Application Filing Year
- G21K Class
- 339 Applications Filed
- 303 Patents Issued To-Date
- 89.39 % Issued To-Date
Cited Art Landscape
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- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 11 Age