ION IMPLANTER POWER SUPPLY WHICH IS INTENDED TO LIMIT THE LOADING EFFECT
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United States of America Patent
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Issued Date -
Apr 24, 2014
app pub date -
Jun 14, 2005
filing date -
Jun 16, 2004
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Abandoned
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Abstract
The invention relates to a power supply ALT for an ion implanter, the power supply comprising: an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, and a capacitor CDS in a parallel branch likewise connected between the substrate-carrier tray PPS and ground E. The capacitor CDS has a capacitance of less than 5 nF. The invention also provides an ion implanter incorporating the power supply.
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