INORGANIC POLYSILAZANE, SILICA FILM-FORMING COATING LIQUID CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM
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United States of America Patent
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Issued Date -
Apr 17, 2014
app pub date -
Apr 9, 2012
filing date -
Jun 13, 2011
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Abandoned
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Abstract
Disclosed is an inorganic polysilazane that undergoes less shrinkage during a calcination step in an oxidizing agent such as water vapor and is less prone to allow a silica film to suffer from the formation of cracks or peel off from a semiconductor substrate, and a silica film-forming coating liquid containing the inorganic polysilazane, and also provides an inorganic polysilazane and a silica film-forming coating liquid containing the same. The value of A/(B+C) is 0.9-1.5 and the value of (A+B)/C is 4.2-50. A=peak area within the range of from 4.75 ppm to less than 5.4 ppm. B=peak area within the range of from 4.5 ppm to less than 4.75 ppm. Peak area within the range of from 4.2 ppm to less than 4.5 ppm is represented by C in a 1H-NMR spectrum; and the polystyrene-equivalent mass average molecular weight is 2000 to 20000.
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