METHOD OF AND APPARATUS FOR IN-SITU REPAIR OF REFLECTIVE OPTIC
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United States of America Patent
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Issued Date -
Apr 17, 2014
app pub date -
Oct 12, 2012
filing date -
Oct 12, 2012
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Abandoned
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Abstract
Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.
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