Stripping and Cleaning Compositions for Removal of Thick Film Resist
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United States of America Patent
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app pub date -
Oct 1, 2013
filing date -
Oct 8, 2012
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Abstract
Stripping and cleaning compositions suitable for the removal of film resists include about 2-55% by weight of at least one alkanolamine or at least one morpholine or mixtures thereof; about 20-94% by weight of at least one organic solvent; and about 0.5-60% by weight water based on the total weight of the composition.
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