Stripping and Cleaning Compositions for Removal of Thick Film Resist

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United States of America Patent

SERIAL NO

14043330

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Abstract

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Stripping and cleaning compositions suitable for the removal of film resists include about 2-55% by weight of at least one alkanolamine or at least one morpholine or mixtures thereof; about 20-94% by weight of at least one organic solvent; and about 0.5-60% by weight water based on the total weight of the composition.

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Patent Owner(s)

Patent OwnerAddress
VERSUM MATERIALS US LLC8555 SOUTH RIVER PARKWAY TEMPE AS 85284

International Classification(s)

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Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201320142015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Egbe, Matthew I West Norriton, US 19 397
Rao, Madhukar Bhaskara Fogelsville, US 34 529
Wu, Aiping Macungie, US 35 803

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  • 10 Citation Count
  • G03F Class
  • 6.84 % this patent is cited more than
  • 11 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges5953215649231386152801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0255075100125150175200225250275300325350375400425450475500525550575

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