Apparatus for filtration and gas-vapor mixing in thin film deposition
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United States of America Patent
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Issued Date -
Apr 10, 2014
app pub date -
Dec 16, 2013
filing date -
May 30, 2008
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Abandoned
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Abstract
An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.
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