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Abstract

The disclosure belongs to the field of manufacturing and interconnection of integrated circuits, and in particular relates to compound dielectric anti-copper-diffusion barrier layer for copper interconnection and a manufacturing method thereof The disclosure uses compound dielectric (oxide & metal) as the anti-copper-diffusion barrier layer. First, it can enhance the capable of metal for anti-copper-diffusion efficiently, and prevent the barrier layer for valid owing to oxidized and prolong the life of the barrier layer. Second, it can reduce the effective dielectric constant of the interconnection circuits and furthermore reduce the RC delay of the whole interconnection circuits. Besides, the alloy is firmly adhered to the copper, and the metal copper can be directly electroplated without growing a layer of seed crystal copper. The method is simple and feasible and is expected to be applied to manufacturing of the anti-copper-diffusion barrier layers for copper interconnections.

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