Film Deposition Apparatus and Film Deposition Method
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United States of America Patent
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Issued Date -
Mar 27, 2014
app pub date -
Sep 13, 2012
filing date -
Jan 31, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A film deposition apparatus includes: a chamber including a chamber wall that is formed with a window; a target holder disposed in the chamber for supporting a target; a radio frequency power device; a pole plate unit disposed in the chamber and including a first pole plate that is electrically connected to the radio frequency power device, and a second pole plate for supporting the substrate, the first and second pole plates being disposed at two opposite sides of the target holder; a vacuum device to extract air from the chamber; and a pulsed laser device to generate a laser beam capable of bombarding the target through the window.
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