BAFFLE AND METHOD FOR TREATING SURFACE OF THE BAFFLE, AND SUBSTRATE TREATING APPARATUS AND METHOD FOR TREATING SURFACE OF THE APPARATUS

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Issued Date
Mar 27, 2014
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Aug 9, 2013
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Sep 24, 2012

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Abstract

Provided is a baffle. The baffle has holes for distributing a process gas excited in a plasma state. A surface of the baffle is treated by using a surface treating material containing an aromatic compound.

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Patent Owner	Address
PSK INC	GYEONGGI DO SOUTH KOREA

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
JI, YoungYeon	Hwaseong-si, KR	2	1

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BAFFLE AND METHOD FOR TREATING SURFACE OF THE BAFFLE, AND SUBSTRATE TREATING APPARATUS AND METHOD FOR TREATING SURFACE OF THE APPARATUS

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United States of America Patent

13963162

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13963162

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