DEVICE AND METHOD FOR MONITORING THE PRESENCE, ONSET AND EVOLUTION OF PARTICULATES IN CHEMICALLY OR PHYSICALLY REACTING SYSTEMS
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United States of America Patent
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Mar 20, 2014
app pub date -
Feb 14, 2012
filing date -
Feb 14, 2011
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Abstract
A device for monitoring particulates includes a means for correlating measurements of pressure across at least one filter, flow rate of a sample through the filter, or a combination thereof to the properties of particulates in a solution. More particularly, the device can be used for monitoring particulates in a reacting system to provide signals to the user or control input to the reacting system to alter the course of the reaction according to a desired path.
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