METHOD FOR PASSIVATING TANTALUM METAL SURFACE AND APPARATUS THEREOF
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United States of America Patent
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Issued Date -
Mar 20, 2014
app pub date -
Mar 23, 2011
filing date -
Mar 23, 2011
priority date (Note) -
Abandoned
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Abstract
A method for passivating tantalum metal surface is provided, the method comprises cooling tantalum metal to or below 32° C. and/or passivating tantalum metal surface by oxygen-containing gas with a temperature of 0° C. or below. Also provided is an apparatus for passivating tantalum metal surface for applying the method, comprising a heat treatment furnace, an argon forced-cooling device and/or a device for cooling oxygen-containing gas.
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